The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

May. 17, 2021
Applicant:

Ineos Styrolution Group Gmbh, Frankfurt am Main, DE;

Inventors:

Hans-Werner Schmidt, Bayreuth, DE;

Klaus Kreger, Wiesau, DE;

Bastian Klose, Gottmadingen, DE;

Assignee:

INEOS STYROLUTION GROUP GMBH, Frankfurt am Main, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 9/12 (2006.01); C07C 233/43 (2006.01); C07C 233/62 (2006.01); C07C 233/80 (2006.01); C08J 9/00 (2006.01); C08K 5/20 (2006.01);
U.S. Cl.
CPC ...
C08K 5/20 (2013.01); C07C 233/43 (2013.01); C07C 233/62 (2013.01); C07C 233/80 (2013.01); C08J 9/0028 (2013.01); C08J 9/122 (2013.01); C08J 2203/06 (2013.01); C08J 2205/044 (2013.01); C08J 2205/052 (2013.01); C08J 2325/06 (2013.01); C08J 2325/12 (2013.01);
Abstract

The invention relates to a process for producing small-cell foams from a styrene-polymer component (S) and an additive of formula (I), wherein Z represents a C-C-alkylene group or an oxygen or sulfur atom, Rand Rrepresent, e.g., a C-C-alkyl residue, C-C-cycloalkyl residue or benzyl residue; and R, R, Rand Rrepresent hydrogen or a C-C-alkyl residue, comprising the steps of: —heating at least a styrene-polymer component (S) to obtain a molten, polymeric molding compound, —introducing a propellant (T) into the molten molding compound to form a foamable composition (Z), and—foaming the foamable composition to obtain a foamed molding, the molten polymeric molding compound containing at least one carboxylic acid derivative of the general formula (I).


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