The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Mar. 22, 2021
Applicant:

Fujibo Holdings, Inc., Tokyo, JP;

Inventors:

Teppei Tateno, Ehime, JP;

Ryuma Matsuoka, Ehime, JP;

Hiroshi Kurihara, Ehime, JP;

Satsuki Yamaguchi, Ehime, JP;

Yamato Takamizawa, Ehime, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/04 (2012.01); C08J 5/18 (2006.01); C08J 9/00 (2006.01); C08J 9/18 (2006.01); H10P 52/40 (2026.01);
U.S. Cl.
CPC ...
B24B 37/042 (2013.01); C08J 5/18 (2013.01); C08J 9/0061 (2013.01); C08J 9/18 (2013.01); C08J 2203/22 (2013.01); C08J 2375/08 (2013.01); C08J 2433/20 (2013.01); H10P 52/402 (2026.01);
Abstract

A polishing pad including a polyurethane sheet as a polishing layer, wherein the polyurethane sheet has a ratio (E'/E′) of a storage elastic modulus E′at 40° C. in dynamic viscoelasticity measurement performed under a bending mode condition with a frequency of 1.6 Hz to a storage elastic modulus E′at 40° C. in dynamic viscoelasticity measurement performed under a tension mode condition with a frequency of 1.6 Hz of 0.60 to 1.60.


Find Patent Forward Citations

Tateno, Teppei. (2026). Polishing pad and method for producing polished product (U.S. Patent No. 12629792). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12629792

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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