The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Dec. 16, 2021
Applicant:

Dic Corporation, Tokyo, JP;

Inventors:

Takaaki Fuse, Ichihara, JP;

Kazumi Oi, Ichihara, JP;

Naoki Hada, Ichihara, JP;

Youhei Suganuma, Ichihara, JP;

Kazuyasu Kawashima, Ichihara, JP;

Akira Sato, Ichihara, JP;

Assignee:

DIC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 63/06 (2006.01); B01D 19/00 (2006.01); B01D 61/00 (2006.01); B01D 63/02 (2006.01); B01D 63/04 (2006.01); B01D 69/04 (2006.01);
U.S. Cl.
CPC ...
B01D 63/069 (2022.08); B01D 19/0031 (2013.01); B01D 19/0063 (2013.01); B01D 61/00 (2013.01); B01D 63/0241 (2022.08); B01D 63/046 (2013.01); B01D 69/04 (2013.01); B01D 2313/10 (2013.01); B01D 2313/12 (2013.01); B01D 2313/13 (2013.01);
Abstract

A degassing apparatus capable of preventing cross-contamination is provided. A degassing apparatus includes degassing modules each having a tube unit that is a gas permeable membrane separating a fluid circulation space and a reduced-pressure space from each other, vacuum piping communicatively connected to the reduced-pressure spaces, a discharge device that discharges gas in the reduced-pressure spaces through the vacuum piping, atmospheric release piping communicatively connected to the reduced-pressure spaces, an atmospheric release valve capable of introducing atmosphere into the reduced-pressure spaces through the atmospheric release piping, and a control unit that controls the operation of the discharge device and the atmospheric release valve. The control unit performs control to close the atmospheric release valve to perform a process of discharging gas in the reduced-pressure spaces by the discharge device when a degassing process is being performed, and performs control to open the atmospheric release valve to open the reduced-pressure spaces.


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