The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Oct. 04, 2023
Applicant:

GE Precision Healthcare Llc, Waukesha, WI (US);

Inventors:

Changlyong Kim, Brookfield, WI (US);

Tyler Egan Curtis, Wauwatosa, WI (US);

Fengchao Zhang, Hartland, WI (US);

Jiahua Fan, New Berlin, WI (US);

Louis Carbonne, Taby, SE;

Erik Fredenberg, Stockholm, SE;

Johannes Loberg, Stockholm, SE;

Björn Cederström, Stockholm, SE;

Assignee:

GE Precision Healthcare LLC, Waukesha, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 6/03 (2006.01); A61B 6/42 (2024.01); A61B 6/58 (2024.01); G01N 23/046 (2018.01);
U.S. Cl.
CPC ...
A61B 6/032 (2013.01); A61B 6/4241 (2013.01); A61B 6/583 (2013.01); A61B 6/585 (2013.01); G01N 23/046 (2013.01);
Abstract

An X-ray imaging system, such as a computed tomography (CT) computed tomography (CT) imaging system is provided for material decomposition calibration and intended for use with a calibration phantom. The X-ray imaging system comprises an X-ray source configured to emit X-rays and an X-ray detector arranged in the X-ray beam path configured to generate detector data. The calibration phantom is located in the X-ray beam path. The X-ray imaging system further comprises an X-ray beam limiting device including at least one calibration element in the X-ray beam path. The X-ray imaging system also comprises image processing circuitry configured to acquire projection data for a set of projections based on the detector data, and to determine pathlengths through at least one material of the at least one calibration element and at least one material of the calibration phantom, at least partly based on acquired projection data, for performing material decomposition calibration.


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