The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Mar. 06, 2023
Applicant:
Nanya Technology Corporation, New Taipei City, TW;
Inventor:
Hsih-Yang Chiu, Taoyuan City, TW;
Assignee:
NANYA TECHNOLOGY CORPORATION, New Taipei City, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10W 20/40 (2026.01); H10P 14/60 (2026.01); H10W 10/00 (2026.01); H10W 10/20 (2026.01); H10W 20/00 (2026.01); H10W 20/41 (2026.01); H10W 20/43 (2026.01); H10W 20/46 (2026.01); H10W 20/47 (2026.01); H10W 20/48 (2026.01); H10W 44/00 (2026.01);
U.S. Cl.
CPC ...
H10W 20/483 (2026.01); H10W 20/48 (2026.01); H10W 44/601 (2026.01); H10P 14/60 (2026.01); H10W 10/021 (2026.01); H10W 10/20 (2026.01); H10W 20/435 (2026.01);
Abstract
A circuit structure and a method of manufacturing a circuit structure are provided. The circuit structure includes a first metal line and a second metal line. The second metal line is disposed over the first metal line. At least one air gap is disposed between the first metal line and the second metal line.
Quick Actions:
Chiu, Hsih-Yang. (2026). Circuit structure including at least one air gap and method for manufacturing the same (U.S. Patent No. 12628642). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12628642
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile