The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Apr. 13, 2023
Disco Corporation, Tokyo, JP;
Kentaro Odanaka, Tokyo, JP;
Deckers Outdoor Corporation, Goleta, CA (US);
Abstract
First penetrating paths that penetrate an insulating film are formed by irradiation with a laser beam along the boundaries of multiple devices from a surface side of the insulating film prior to formation of a mask used when a wafer is divided by plasma etching (protective film forming step and second laser beam irradiation step). In this case, the irradiation condition of the laser beam for removing the desired part of the insulating film and the irradiation condition of the laser beam for forming the mask, that is, for removing the desired part of a protective film, can each be set to a preferable condition. As a result, it becomes possible to improve the processing accuracy when the wafer is divided to manufacture chips.