The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Sep. 16, 2022
Apple Inc., Cupertino, CA (US);
Magnus H Johnson, San Francisco, CA (US);
Eric Geusz, San Francisco, CA (US);
Jeremy R Bernstein, San Francisco, CA (US);
Novaira Masood, San Jose, CA (US);
Pravalika Avvaru, Union City, CA (US);
Randal W Lamore, San Francisco, CA (US);
Apple Inc., Cupertino, CA (US);
Abstract
A point cloud having occluded regions may be infilled with additional points by creating an infill mask and a synthesized representation, wherein the synthesized representation comprises generated information for points of the occluded regions. The infill mask and the synthesized representation may both be generated using a 2D version of the point cloud generated by rasterizing the 3D point cloud and respectively using a first and second machine learning techniques to generate the infill mask and the synthesized representation. Points identified in the occluded regions may be selected, matched with the information generated in the synthesized representation, and infilled into the point cloud.