The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Dec. 14, 2023
Advanced Micro Devices, Inc., Santa Clara, CA (US);
Holger Gruen, Munich, DE;
David Ronald Oldcorn, Milton Keynes, GB;
David Kirk Mcallister, Santa Clara, CA (US);
Advanced Micro Devices, Inc., Santa Clara, CA (US);
Abstract
Devices and methods for rendering a scene using ray tracing are provided which include prior to ray tracing any frame of the scene: generating, for each frame, a low resolution mesh from a high resolution mesh representing objects in the scene, the low resolution mesh comprising a plurality of micro-meshes each defining a geometric shape; sub-dividing the micro-meshes; and generating, for each micro-mesh, a displaced micro-mesh. For a frame of the scene, at least one displaced micro-mesh is traced using a bounding prism hierarchy on a condition that a prism is hit by the ray. The bounding prism hierarchy comprises the prism bounding the displaced micro-mesh and a plurality of sub-prisms each bounding a portion of the displaced micro-mesh. At least one other displaced micro-mesh is ray traced using the prism without the plurality of sub-prisms on a condition that the prism is not hit by the ray.