The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Sep. 14, 2022
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Shay Yosub, Kfar Yehezkel, IL;

Noam Badt, Tel Aviv, IL;

Boris Morgenstein, Tel Aviv, IL;

Yuval Vardi, Tel Aviv, IL;

David Pawlowski, Tel Aviv, IL;

Assaf Avraham, Givatayim, IL;

Pieter Spinnewyn, Los Gatos, CA (US);

Tom Levy, Holon, IL;

Yohai Zmora, San Francisco, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/521 (2017.01); G06T 5/50 (2006.01); G06V 10/141 (2022.01); G06V 10/24 (2022.01); G06V 10/74 (2022.01);
U.S. Cl.
CPC ...
G06T 7/521 (2017.01); G06T 5/50 (2013.01); G06V 10/141 (2022.01); G06V 10/245 (2022.01); G06V 10/761 (2022.01); G06T 2207/10028 (2013.01); G06T 2207/20221 (2013.01);
Abstract

A method for depth mapping includes providing a depth mapping device comprising a projector, which is configured to project a pattern of optical radiation onto a target area over a first field of view about a projection axis, and a camera, which is configured to capture images of the target area within a second field of view, narrower than the first field of view, about a camera axis, which is offset transversely relative to the projection axis. The projector projects the pattern onto first and second planes at first and second distances from the camera, and the camera captures first and second reference images containing first and second parts of the pattern on the first and second planes, respectively. The first and second reference images are combined to produce an extended reference image including both the first and second parts of the pattern.


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