The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Jun. 20, 2023
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Celia Cintas, Nairobi, KE;

Girmaw Abebe Tadesse, Nairobi, KE;

Skyler Speakman, Nairobi, KE;

Komminist Weldemariam, Ottawa, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/044 (2023.01);
U.S. Cl.
CPC ...
G06N 3/044 (2023.01);
Abstract

Anomaly detection in neural networks is provided. The method comprises extracting, from different layers of a recurrent neural network (RNN) for a specified time interval, a number of on-the-fly node activations produced by sequences of event data from a number of data sources and sensors. The method references known node activations of the RNN produced by normal sequences of event data, and for each layer of the RNN, calculates a maximum nonparametric divergence of the on-the-fly node activations from the known node activations. For each layer of the RNN, the method determines a subset of nodes that most contribute to the maximum nonparametric divergence for that layer for a given time window and identifies data sources or sensors from among the number of data sources and sensors responsible for activating the subset of nodes that most contribute to the maximum nonparametric divergence for each layer.


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