The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Dec. 28, 2021
Samyang Corporation, Seoul, KR;
Chun Rim Oh, Seoul, KR;
Dae Hyuk Choi, Seoul, KR;
Yu Na Choi, Daejeon, KR;
Deuk Rak Lee, Daejeon, KR;
Ji Eun Choi, Seongnam-si, KR;
Ki Tae Kang, Gimpo-si, KR;
Min Jung Kim, Sejong, KR;
Won Jung Lee, Daejeon, KR;
Chi Wan Lee, Daejeon, KR;
SAMYANG CORPORATION, Seoul, KR;
Abstract
The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition each comprising same and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition each comprising same, wherein the compound has excellent absorbance for light of i-line (365 nm) wavelength, is greatly easy to prepare into a polymerizable composition due to very high solubility in an organic solvent, has good thermal stability, and shows a favorable acid generation rate.