The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Jan. 18, 2022
Applicant:

Seoul National University R&db Foundation, Seoul, KR;

Inventors:

Yongtaek Hong, Seoul, KR;

Taehoon Kim, Seoul, KR;

Daesik Kim, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 7/16 (2006.01); B41M 3/00 (2006.01);
U.S. Cl.
CPC ...
G01B 7/18 (2013.01); B41M 3/008 (2013.01);
Abstract

A method for manufacturing a strain sensor comprises the steps of: preparing a solution to be used as a conductive thin-film material and a flexible substrate; forming, on the flexible substrate, a stress concentration structure by repeatedly depositing a micro notch formed to have a structure having a boundary on a two-dimensional plane (the xy plane) or have a three-dimensional structure having a boundary in a direction perpendicular to the plane (the z direction); and forming a strain sensor by depositing a conductive thin film on the flexible substrate in such a way that the conductive thin film overlaps at least a portion of the stress concentration structure. Accordingly, the stress concentration structure can be manufactured at a desired location through patterning, and can be applied for various purposes by controlling the sensitivity and linearity by adjusting the arrangement of the structure and the thickness of the conductive thin film.


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