The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Jun. 29, 2022
Applicant:

Central Glass Co., Ltd., Ube, JP;

Inventors:

Akiou Kikuchi, Yamaguchi, JP;

Masato Shinagawa, Yamaguchi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/14 (2006.01); H10P 14/40 (2026.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); C23C 16/14 (2013.01); H10P 14/412 (2026.01);
Abstract

The present invention relates to a method for removing MoFor MoFand MoOF, including: bringing a halogen-containing gas into contact with a member having a deposit or a coating of MoFor MoFand MoOF(where x represents a number greater than 0 and less than 6); and removing MoFor MoFand MoOFfrom the member, a method for removing a deposit or a coating from a member having the deposit or the coating of MoFor MoFand MoOFmixed as impurities in MoFby a method for producing a semiconductor device including the above removing method, and a method for producing a semiconductor device that includes removing a deposit or a coating from a semiconductor device production apparatus having a deposit or coating of MoFor MoFand MoOF, and that can avoid clogging or contamination of the production apparatus.


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