The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Jun. 05, 2023
Applicant:
Raytheon Technologies Corporation, Farmington, CT (US);
Inventors:
Kenneth D. Smith, East Longmeadow, MA (US);
John A. Sharon, West Hartford, CT (US);
Ryan M. Deacon, Colchester, CT (US);
Soumalya Sarkar, Manchester, CT (US);
Assignee:
RTX Corporation, Farmington, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 30/00 (2006.01);
U.S. Cl.
CPC ...
C22C 30/00 (2013.01);
Abstract
An alloy comprising by weight percent: 16.0-26.0 Cr; 23.0-34.0 Mo; 21.0-31.0 Ta; 0.50-3.5 Ti; and 17.0-27.0 V.
Smith, Kenneth. (2026). High entropy alloy (U.S. Patent No. 12624426). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12624426
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile