The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Nov. 25, 2020
Fujifilm Corporation, Tokyo, JP;
Shinichi Nakai, Kanagawa, JP;
Kosuke Taniguchi, Kanagawa, JP;
Nobuyuki Haraguchi, Kanagawa, JP;
Tsukasa Ishihara, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provide are a cell culture method which includes using a culture vessel which contains a cell suspension containing cells and discharging a gas including 30% by volume or more of oxygen into the cell suspension from a sparger disposed in the culture vessel to culture the cells, in which an average hole diameter in a gas discharge portion in the sparger is 1 μm or more and 300 μm or less, and a surface area A (m) in the gas discharge portion in the sparger, a volume X (m) of the cell suspension in the culture vessel, and a flow rate Q (m/min) of the gas that is discharged from the sparger satisfy a specific relationship, a product producing method including the cell culture method, and a cell culture device that enables the cell culture method.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile