The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Aug. 03, 2020
Applicant:

Hansol Chemical Co., Ltd., Seoul, KR;

Inventors:

Hyo-Suk Kim, Jeollabuk-do, KR;

Min-Sung Park, Daejeon, KR;

Min-Hyuk Nim, Jeollabuk-do, KR;

Jang-Hyeon Seok, Sejong-si, KR;

Jung-Woo Park, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 13/00 (2006.01);
U.S. Cl.
CPC ...
C07F 13/00 (2013.01);
Abstract

The present invention relates to a vapor deposition compound capable of being deposited as a thin film through vapor deposition and, in particular, to: an organometal-containing compound which can be applied to an atomic layer deposition (ALD) method or a chemical vapor deposition (CVD) method and has excellent reactivity, volatility, and thermal stability; a precursor composition comprising the organometallic compound; a method for manufacturing a thin film using the precursor composition; and an organometal-containing thin film manufactured using the precursor composition.


Find Patent Forward Citations

Kim, Hyo-Suk. (2026). Organometallic compound, precursor composition comprising same, and method for manufacturing thin film using same (U.S. Patent No. 12624059). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12624059

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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