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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12624016 B1

PDFFull Text
Date of Patent:
May. 12, 2026

Filed:

Apr. 11, 2022

Salt, acid generator, resist composition and method for producing resist pattern

Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Katsuhiro Komuro, Osaka, JP;

Jun Oguma, Osaka, JP;

Koji Ichikawa, Osaka, JP;

Assignee:

SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;

Attorney:

Panitch Schwarze Belisario & Nadel LLP

Primary Examiner:

PO-Chih Chen

Int. Cl.
CPC ...
C07D 335/10 (2006.01); C07D 307/77 (2006.01); C07D 333/54 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
C07D 335/10 (2013.01); C07D 307/77 (2013.01); C07D 333/54 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract

Provided are a salt capable of producing a resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition: wherein, in formula (I), R, R, R, R, Rand Reach represent a halogen atom, a haloalkyl group, etc.; A, Aand Aeach represent a hydrocarbon group, etc.; m1 and m4, m5, m6 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; Xrepresents a single bond, —CH—, —O—, —S—, —CO—, —SO— or —SO—; and AIrepresents an organic anion.

Find Patent Forward Citations

Komuro, Katsuhiro. (2026). Salt, acid generator, resist composition and method for producing resist pattern (U.S. Patent No. 12624016). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12624016

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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