The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Sep. 29, 2021
Applicant:

Samyang Corporation, Seoul, KR;

Inventors:

Chun Rim Oh, Seoul, KR;

Dae Hyuk Choi, Seoul, KR;

Min Jung Kim, Daejeon, KR;

Deuk Rak Lee, Daejeon, KR;

Won Jung Lee, Daejeon, KR;

Yu Na Choi, Daejeon, KR;

Ji Eun Choi, Seongnam-si, KR;

Assignee:

SAMYANG CORPORATION, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 221/14 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
C07D 221/14 (2013.01); G03F 7/0045 (2013.01);
Abstract

The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition which comprise same, and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition which comprise same, the compound having an excellent absorbance of light with an i-line wavelength (365 nm), having a high solubility in an organic solvent, having excellent thermal stability, and exhibiting a good acid generation rate.


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