The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Jan. 13, 2022
University of Central Florida Research Foundation, Inc., Orlando, FL (US);
Lei Zhai, Orlando, FL (US);
University of Central Florida Research Foundation, Inc., Orlando, FL (US);
Abstract
Methods of forming an antiviral facial mask that is capable of not only filtering pathogen particles, but also deactivating pathogen particles prior to exposure by the wearer. Typical facial masks do not deactivate pathogen particles, but rather merely capture viral particles on an outer surface of the mask. As such, the masks present a risk of interaction between the mask wearer and the particles, such as during the removal and/or application of the masks. Methods of forming enhanced antiviral facial masks include the formation of fibers via electrospinning, such that the fibers include a solution of two oppositely charged polyelectrolytes, surfactants, and metal ions. In use, water from human breath activates the surfactants to capture and deactivate pathogen particles. Moreover, the strength of the fibers from the oppositely charged polyelectrolytes results in increased lifespans of the masks, as the masks do not breakdown in the presence of high humidity.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile