The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

Apr. 06, 2023
Applicant:

Via Technologies, Inc., New Taipei City, TW;

Inventor:

Ke-Yuan Chen, New Taipei City, TW;

Assignee:

VIA TECHNOLOGIES, INC., New Taipei City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 89/60 (2025.01);
U.S. Cl.
CPC ...
H10D 89/713 (2025.01);
Abstract

An electrostatic discharge protection device is provided. The electrostatic discharge protection device includes first and second N-type deep well (DNW) regions in a P-type semiconductor substrate, first to fourth N-type and P-type doped regions, and first and second P-type well (PW) regions. The first N-type and P-type doped regions and the first PW region are located in the first DNW region. The second N-type and P-type doped regions and the second PW region are located in the second DNW region. The third and fourth N-type and P-type doped regions are located in the first and second PW regions. The first P-type and fourth N-type doped regions are connected to an input/output terminal. The first N-type and second P-type doped regions are connected to a power supply terminal. The third N-type and the fourth P-type doped regions are connected to a ground terminal.


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