The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

Nov. 01, 2022
Applicant:

Alpha and Omega Semiconductor (Cayman) Ltd., Grand Cayman, KY;

Inventors:

Yi Su, Cupertino, CA (US);

Madhur Bobde, Sunnyvale, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10D 84/00 (2025.01); H01L 21/266 (2006.01); H01L 21/28 (2025.01); H01L 21/306 (2006.01); H01L 21/321 (2006.01); H10D 8/01 (2025.01); H10D 8/60 (2025.01); H10D 30/01 (2025.01); H10D 30/66 (2025.01); H10D 62/10 (2025.01); H10D 62/13 (2025.01); H10D 62/17 (2025.01); H10D 64/27 (2025.01); H10D 64/62 (2025.01); H10D 64/64 (2025.01);
U.S. Cl.
CPC ...
H10D 84/146 (2025.01); H01L 21/266 (2013.01); H01L 21/28035 (2013.01); H01L 21/30604 (2013.01); H01L 21/3212 (2013.01); H10D 8/051 (2025.01); H10D 8/60 (2025.01); H10D 30/0297 (2025.01); H10D 30/665 (2025.01); H10D 30/668 (2025.01); H10D 62/111 (2025.01); H10D 62/127 (2025.01); H10D 62/153 (2025.01); H10D 62/393 (2025.01); H10D 64/513 (2025.01); H10D 64/62 (2025.01); H10D 64/64 (2025.01);
Abstract

A trench metal-oxide-semiconductor field-effect transistor (MOSFET) device comprises an active cell area including a plurality of superjunction trench power MOSFETs formed in an epitaxial layer. Each MOSFET includes source and body regions and a contact trench formed between first and second gate trenches. A region of the epitaxial layer between the gate trenches extends to the top surface of the epitaxial layer. An insulated gate electrode is formed in each gate trench. At least a portion of the contact trench extends from a top surface of the epitaxial layer to a depth that is shallower than the bottom of the body region.


Find Patent Forward Citations

Su, Yi. (2026). Schottky diode integrated into superjunction power mosfets (U.S. Patent No. 12622047). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12622047

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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