The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

May. 31, 2022
Applicant:

Sumitomo Electric Industries, Ltd., Osaka, JP;

Inventors:

Yu Saitoh, Osaka, JP;

Takeyoshi Masuda, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 12/00 (2025.01); H10D 30/01 (2025.01); H10D 30/66 (2025.01); H10D 62/17 (2025.01); H10D 62/832 (2025.01);
U.S. Cl.
CPC ...
H10D 62/8325 (2025.01); H10D 30/0297 (2025.01); H10D 30/668 (2025.01); H10D 62/393 (2025.01);
Abstract

A silicon carbide semiconductor device includes a silicon carbide substrate that has first and second main surfaces and that includes a drift region being of a first-conductivity-type, a body region provided on the drift region and being of a second-conductivity-type, a source region provided on the body region and being of the first-conductivity-type, and a first electric field relaxation region being of the second-conductivity-type and including a first plane in which an impurity-concentration of the second-conductivity-type is a maximum and a second plane in which the impurity-concentration of the second-conductivity-type of 1/10 of the maximum, the second plane being closer to the second main surface than the first plane is. A distance between the first and second planes is 1.0 μm or greater, and a distance from the first main surface to an interface between the first electric field relaxation region and the drift region is 2.0 μm or greater.


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