The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

Aug. 28, 2023
Applicant:

Institute of Microelectronics, Chinese Academy of Sciences, Beijing, CN;

Inventors:

Sen Huang, Beijing, CN;

Qimeng Jiang, Beijing, CN;

Xinyue Dai, Beijing, CN;

Xinhua Wang, Beijing, CN;

Xinyu Liu, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 30/47 (2025.01); H10D 30/01 (2025.01); H10D 62/13 (2025.01); H10D 64/00 (2025.01); H10D 64/23 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 30/478 (2025.01); H10D 30/015 (2025.01); H10D 30/4732 (2025.01); H10D 30/475 (2025.01); H10D 62/13 (2025.01); H10D 64/111 (2025.01); H10D 64/251 (2025.01); H10D 64/513 (2025.01); H10D 64/112 (2025.01);
Abstract

The folded channel gallium nitride based field-effect transistor includes: a base layer; a multi-heterojunction layer, including a channel layer and a barrier layer alternatingly stacked from bottom to top on a gallium nitride semi-insulating layer; a gallium nitride control layer on the multi-heterojunction layer and extending from one side of the channel region to at least a part of the groove; a current collapse suppression structure formed on the multi-heterojunction layer on another side of the channel region; a source electrode and a drain electrode that are respectively in contact with two sides of the multi-heterojunction layer on the gallium nitride semi-insulating layer; a gate electrode formed on the multi-heterojunction layer between the source electrode and the gallium nitride control layer; and a connecting structure passing over the gate electrode to electrically connect to the source electrode and the gallium nitride control layer.


Find Patent Forward Citations

Huang, Sen. (2026). Folded channel gallium nitride based field-effect transistor and method of manufacturing the same (U.S. Patent No. 12622013). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12622013

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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