The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

Nov. 03, 2023
Applicant:

Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;

Inventors:

Lei Shen, Shenzhen, CN;

Chuhan Zhou, Shenzhen, CN;

Ruixin Zhang, Shenzhen, CN;

Kai Zhao, Shenzhen, CN;

Tao Wang, Shenzhen, CN;

Yingyi Zhang, Shenzhen, CN;

Shouhong Ding, Shenzhen, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 21/32 (2013.01); G06V 10/42 (2022.01); G06V 10/44 (2022.01); G06V 10/54 (2022.01); G06V 10/80 (2022.01);
U.S. Cl.
CPC ...
G06F 21/32 (2013.01); G06V 10/42 (2022.01); G06V 10/44 (2022.01); G06V 10/54 (2022.01); G06V 10/806 (2022.01);
Abstract

An identity recognition method includes: acquiring biometric pattern information describing a biometric pattern of a first object; performing feature extraction on the biometric pattern information to obtain a global pattern feature and a local pattern feature; fusing the global pattern feature and the local pattern feature to obtain a fused pattern feature of the first object; and performing identity recognition on the first object based on the fused pattern feature of the first object.


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