The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2026
Filed:
Sep. 30, 2022
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kenichi Ohno, Sunnyvale, CA (US);
Takashi Kuratomi, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/02 (2006.01); C30B 23/02 (2006.01); C30B 28/12 (2006.01); C30B 29/16 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
G02B 1/02 (2013.01); C30B 23/02 (2013.01); C30B 28/12 (2013.01); C30B 29/16 (2013.01); H01J 37/3405 (2013.01); H01J 2237/332 (2013.01);
Abstract
Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to an optical device layer stack, an optical device formed from the optical device layer stack, and a method of forming an optical device layer stack.
Ohno, Kenichi. (2026). Rutile phase tiox deposition with preferred crystal orientations (U.S. Patent No. 12619004). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12619004
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile