The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

Oct. 25, 2023
Applicant:

Sefar Ag, Heiden, CH;

Inventors:

Mohammad Mokbul Hossain, Heiden, CH;

Christoph Ellenberger, Kriessern, CH;

Karim Chakhari, St. Gallen, CH;

Assignee:

Sefar AG, Heiden, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D06M 15/256 (2006.01); C09D 5/16 (2006.01); C09D 127/12 (2006.01); D06M 10/02 (2006.01); D06M 10/10 (2006.01); D06M 101/32 (2006.01);
U.S. Cl.
CPC ...
D06M 15/256 (2013.01); C09D 5/1656 (2013.01); C09D 127/12 (2013.01); D06M 10/025 (2013.01); D06M 10/10 (2013.01); D06M 2101/32 (2013.01);
Abstract

The invention relates to a method of producing an object having a fluorinated polymer coating free of per- and polyfluorinated acids and salts thereof, wherein the method comprises a step DF of depositing a fluorinated polymer coating on the object by means of plasma polymerization of a fluorinated precursor monomer and a step IG of exposing the object to an inhibiting gas which inhibits the formation of per- and polyfluorinated acids and salts thereof in or on the deposited fluorinated coating. Thereby step IG is carried out after step DF, and from the start of step DF until the end of step IG the object is treated in a substantially oxygen free atmosphere.


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