The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

Jan. 03, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Lakmal Kalutarage, San Jose, CA (US);

Madhur Sachan, Belmont, CA (US);

Mark Saly, Milpitas, CA (US);

Zhenxing Han, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/06 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45525 (2013.01); C23C 16/06 (2013.01);
Abstract

Embodiments disclosed herein include a method of forming a metal-oxo photoresist. In an embodiment, the method comprises flowing a first precursor into a chamber, where the first precursor comprises a first metal. In an embodiment, the method further comprises flowing a second precursor into the chamber, where the second precursor comprises a second metal that is different than the first metal. In an embodiment, the method further comprises depositing the metal-oxo photoresist on a substrate in the chamber using a dry deposition process using the first precursor and the second precursor.


Find Patent Forward Citations

Kalutarage, Lakmal. (2026). Multiple-metal-containing metal-oxo photoresist films by cvd and ald methods (U.S. Patent No. 12618153). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12618153

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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