The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

Aug. 10, 2022
Applicant:

Safran Ceramics, Le Haillan, FR;

Inventors:

Arnaud Delehouze, Moissy-Cramayel, FR;

Rémi Pierre Robert Bouvier, Moissy-Cramayel, FR;

Manon Fernandez, Moissy-Cramayel, FR;

Assignee:

SAFRAN CERAMICS, Le Haillan, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/442 (2006.01); C23C 16/34 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/442 (2013.01); C23C 16/342 (2013.01); C23C 16/4417 (2013.01);
Abstract

A device for fluidised bed chemical vapour deposition, includes a reactor including a treatment zone in which the fluidised bed chemical vapour deposition is intended to be carried out using at least a first and a second reactive gas and a diffuser under the treatment zone delimiting the reactor, and a heating system configured to heat at least the treatment zone. The device includes a first channel for introducing the first reactive gas and a second channel for introducing the second reactive gas, which second channel is separate from the first channel and opens out under the diffuser, and wherein the first introduction channel is capable of being moved with respect to the heating system.


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