The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2026
Filed:
Feb. 04, 2022
Applicant:
Surfx Technologies Llc, Redondo Beach, CA (US);
Inventors:
Joyce Lee, Long Beach, CA (US);
Thomas Scott Williams, Los Angeles, CA (US);
Robert F. Hicks, Los Angeles, CA (US);
Assignee:
Surfx Technologies LLC, Redondo Beach, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/14 (2006.01); H01J 37/32 (2006.01); H05B 7/16 (2006.01); H05H 1/24 (2006.01); H05H 1/34 (2006.01);
U.S. Cl.
CPC ...
B29C 59/14 (2013.01); H01J 37/32009 (2013.01); H01J 37/32174 (2013.01); H01J 37/32366 (2013.01); H01J 37/32449 (2013.01); H01J 37/32532 (2013.01); H01J 37/32972 (2013.01); H05B 7/16 (2013.01); H05H 1/2406 (2013.01); H05H 1/34 (2013.01); B29C 2059/145 (2013.01); H05H 1/246 (2021.05);
Abstract
Copper oxide films can be reduced to copper with an atmospheric pressure argon and hydrogen plasma at temperatures between 25 and 300° C. A 50-nm-thick CuO layer on a Cu-coated Si wafer, 200 mm in diameter, can be fully reduced by the plasma in 200 seconds at 200° C. The activation energy for the reaction can be approximately 3.7 kcal/mol. X-ray photoelectron spectroscopy can show the copper oxide reduced to metallic copper.