The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2026
Filed:
Dec. 01, 2020
Robert Bosch Gmbh, Stuttgart, DE;
Joachim Rudhard, Leinfelden-Echterdingen, DE;
ROBERT BOSCH GMBH, Stuttgart, DE;
Abstract
A device for processing at least one semiconductor substrate. The device includes: a reactor with a wall which encloses a reaction chamber; a closing structure for loading the reaction chamber with at least one semiconductor substrate and for unloading the at least one semiconductor substrate from the reaction chamber and for hydrofluoric acid-tight closure of the reaction chamber; and a heating device designed to establish at least one specified temperature in at least one temperature range in the reaction chamber. The device further includes: a gas inlet designed to supply hydrofluoric acid in vapor form to the reaction chamber, and a gas outlet designed to remove hydrofluoric acid in vapor form from the reaction chamber; and a gas supply system which is coupled to the gas inlet and is designed to supply hydrofluoric acid in vapor form to the gas inlet at the specified temperature.