The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2026

Filed:

Jun. 25, 2024
Applicant:

Ciena Corporation, Hanover, MD (US);

Inventors:

Alireza Samani, Stittsville, CA;

Michael Vitic, Chelsea, CA;

Sean Sebastian O'keefe, Dunrobin, CA;

Assignee:

Ciena Corporation, Hanover, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10F 30/225 (2025.01); H04B 10/61 (2013.01); H10F 71/00 (2025.01); H10F 77/14 (2025.01);
U.S. Cl.
CPC ...
H10F 30/2255 (2025.01); H04B 10/616 (2013.01); H10F 71/1215 (2025.01); H10F 77/1465 (2025.01);
Abstract

An avalanche photodiode includes a silicon layer on a substrate; a germanium layer on the silicon layer; and a plurality of contacts including a cathode, an anode, and at least two separate gain tuning contacts configured to adjust an electric field to tune multiplication of carriers. The at least two separate gain tuning contacts are configured to control the electric field in the germanium layer and silicon layer. The at least two separate gain tuning contacts are configured to tailor the electric field such that the multiplication of carriers is greater in the silicon layer than the germanium layer. This added gain tuning control can be used to tailor the electric field profile such that multiplication happens mostly in silicon to achieve lower excess noise and little to no bandwidth variation.


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