The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2026
Filed:
Aug. 28, 2024
Applied Materials, Inc., Santa Clara, CA (US);
Wai Ming Tam, Georgetown, MA (US);
Jeffrey Laurence Klein, Methuen, MA (US);
Frank Sinclair, Hartland, ME (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An ion implanter, including an ion source and extraction system, arranged to generate an ion beam at a first ion energy, and a linear accelerator, arranged to accelerate the ion beam to a second ion energy, wherein the linear accelerator comprises a plurality of acceleration stages coupled to receive a plurality of RF signals from a plurality of power assemblies, respectively. The linear accelerator may be configured wherein at least one stage of the plurality of acceleration stages is coupled to: reversibly connect to a first power assembly, comprising a resonator that contains a resonator enclosure, the first power assembly generating a first RF signal at a first frequency; to disconnect from the first power assembly; and to connect to a second power assembly, generating a second RF signal at a second frequency, greater than the first frequency, while not changing the resonator enclosure.