The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2026

Filed:

Jul. 26, 2023
Applicant:

Denso Corporation, Kariya-city, JP;

Inventors:

Kazushi Kawaguchi, Kariya, JP;

Makoto Kamigasako, Kariya, JP;

Assignee:

DENSO CORPORATION, Kariya-city, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 17/00 (2006.01); G01S 7/03 (2006.01); H01Q 1/42 (2006.01);
U.S. Cl.
CPC ...
H01Q 17/00 (2013.01); G01S 7/03 (2013.01); H01Q 1/42 (2013.01);
Abstract

A first layer and a second layer are stacked one another and respectively have different dielectric constants. The dielectric constants are set, such that a first reflected wave and a second reflected wave have a same intensity. A thickness of the first layer is set, such that the first reflected wave and the second reflected wave have a phase difference to at least partially cancel each other. The first reflected wave is reflected on an exposed surface of the first layer when a target radio wave is incident on the exposed surface. The second reflected wave is a reflected wave that is incident from the exposed surface, reflected on a boundary surface between the first layer and the second layer, and emitted from the exposed surface. The exposed surface is on an opposite side of the boundary surface.


Find Patent Forward Citations

Kawaguchi, Kazushi. (2026). Radio wave absorber and method for forming radio wave absorber (U.S. Patent No. 12614858). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12614858

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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