The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2026
Filed:
Feb. 15, 2019
Max-planck-gesellschaft Zur Förderung Der Wissenschaften E.v., Munich, DE;
Umut Tunca Sanli, Stuttgart, DE;
Hakan Ceylan, Stuttgart, DE;
Metin Sitti, Stuttgart, DE;
Gisela Schütz, Stuttgart, DE;
Kahraman Keskinbora, Stuttgart, DE;
Abstract
The present invention is directed to a method for printing a micro-scaled or nano-scaled XUV and/or X-ray Diffractive optic (), including the following steps: a) providing a material () with a first component () being photo-sensitive and being polymerizable by two-photon-absorption, b) providing data () of a desired geometrical structure () of the optic () and creating at least one trajectory () corresponding to the data () of the desired structure () of the optic (), c) providing a high-intensity energy beam (), in particular a laser beam, wherein the beam () comprises a focus (F) having a position being adjustable to a plurality of positions (F, F, <, Fp) being coincident with the at least one trajectory (), d) polymerization of the material () by two-photon-absorption at a first position (Fn) of the focus (F), thereby creating a first voxel (vn) of the structure () of the optic (), adjusting the position of the focus (F) from the first position (Fn) to a subsequent position (Fn+1) of the focus (F) along the at least one trajectory () and repeating step d) at the subsequent position (Fn+1) of the focus (F), wherein a distance (d) between each of the positions (F, F, <, Fp) of the focus (F) and at least one of the rest of the positions (F, F, <, Fp) of the focus (F) is smaller than a mean diameter (vd) of the voxels produced at these positions with respect to their dimension parallel to the distance (d).