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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12611726 B1

PDFFull Text
Date of Patent:
Apr. 28, 2026

Filed:

Apr. 05, 2022

Mask and method for manufacturing the same

Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Jeongkuk Kim, Suwon-si, KR;

Hwi Kim, Suwon-si, KR;

Areum Lee, Suwon-si, KR;

Kyu Hwan Hwang, Seongnam-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:

CANTOR COLBURN LLP

Primary Examiner:

Binh X Tran

Int. Cl.
CPC ...
B23K 26/00 (2014.01); B23K 26/06 (2014.01); B23K 26/0622 (2014.01); B23K 26/38 (2014.01); C23C 14/04 (2006.01); B23K 103/02 (2006.01);
U.S. Cl.
CPC ...
B23K 26/0006 (2013.01); B23K 26/0619 (2015.10); B23K 26/0624 (2015.10); B23K 26/38 (2013.01); C23C 14/042 (2013.01); B23K 2103/02 (2018.08);
Abstract

A mask includes a mask sheet including an upper surface and a lower surface facing the upper surface, the mask sheet including an opening passing through the upper surface and the lower surface; and a mask frame that supports the mask sheet, the mask sheet includes a protrusion adjacent to the opening and protruding from the lower surface, and a recess adjacent to the protrusion and recessed from the lower surface toward the upper surface of the mask sheet.

Find Patent Forward Citations

Quick Actions:

Kim, Jeongkuk. (2026). Mask and method for manufacturing the same (U.S. Patent No. 12611726). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12611726

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