The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2026

Filed:

Oct. 04, 2022
Applicant:

Topcon Corporation, Tokyo, JP;

Inventors:

Masaya Suzuki, Tokyo, JP;

Kazuhiro Yamada, Tokyo, JP;

Hitoshi Shimizu, Tokyo, JP;

Masashi Nakajima, Tokyo, JP;

Assignee:

TOPCON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/12 (2006.01); A61B 3/14 (2006.01);
U.S. Cl.
CPC ...
A61B 3/1216 (2013.01); A61B 3/145 (2013.01);
Abstract

An ophthalmic apparatus includes an illumination optical system and an imaging optical system. The illumination optical system includes a slit with a slit-shaped aperture and an iris aperture with two apertures and is configured to generate slit-shaped illumination light and to guide the illumination light to a fundus of a subject's eye. The imaging optical system includes an imaging aperture with an aperture, and is configured to guide returning light of the illumination light to an image sensor. A width of the slit-shaped aperture, a distance between the two apertures, and a size of the aperture in the imaging aperture are set so that an overlap region of a light flux region of the illumination light and a light flux region of the returning light is located on a side of the fundus from a posterior surface of lens of the subject's eye within the eye.


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