The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2026

Filed:

Oct. 25, 2021
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Hiroaki Ishii, Kyoto, JP;

Ryo Muramoto, Kyoto, JP;

Junichi Ishii, Kyoto, JP;

Takayuki Nishida, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 1/12 (2024.01); B08B 3/08 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02079 (2013.01); B08B 1/12 (2024.01); B08B 3/08 (2013.01); G03F 7/162 (2013.01); H01L 21/02087 (2013.01); H01L 21/02096 (2013.01); H01L 21/0273 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01); H01L 21/68764 (2013.01);
Abstract

A substrate processing system includes a protective film forming liquid supplying unit which supplies a protective film forming liquid to one surface of a substrate, a protective film forming unit which solidifies or hardens the protective film forming liquid and forms a protective film on the one surface of the substrate, a suction unit which suctions the one surface of the substrate, a processing unit which executes predetermined processing with respect to the other surface of the substrate in a state that the one surface of the substrate is suctioned by the suction unit, and a removing liquid supplying unit which has a removing liquid discharge port that discharges a removing liquid being capable of removing the protective film and supplies the removing liquid toward the one surface of the substrate from the removing liquid discharge port.


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