The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2026

Filed:

Mar. 09, 2020
Applicant:

Peking University, Beijing, CN;

Inventors:

Renmin MA, Beijing, CN;

Zengkai Shao, Beijing, CN;

Huazhou Chen, Beijing, CN;

Assignee:

Peking University, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/065 (2006.01); H01S 5/04 (2006.01); H01S 5/042 (2006.01); H01S 5/11 (2021.01); H01S 5/183 (2006.01);
U.S. Cl.
CPC ...
H01S 5/0653 (2013.01); H01S 5/041 (2013.01); H01S 5/042 (2013.01); H01S 5/11 (2021.01); H01S 5/183 (2013.01);
Abstract

A topological bulk laser includes a topological photonic crystal () having an energy band inversion between dipole mode and quadrupole mode near the center of Brillouin zone and a trivial photonic crystal () not having band inversion for splicing to each other. The reflection and confinement of an optical field occurs at the interface; and the interface encloses to form a closed contour, thereby forming a laser cavity with an effective cavity feedback for lasing at the interior of the interface. This band-inversion-induced reflection mechanism induces single-mode lasing with directional vertical emission. At room temperature, the topological bulk laser can achieve low threshold, narrow linewidth, and a high side-mode suppression ratio, reduce the fabrication difficulty and costs, and improve heat dissipation and electrical injection efficiency, hence improving lifetime and stability of devices.


Find Patent Forward Citations

MA, Renmin. (2026). Topological bulk laser and method based on band inversion and reflection of optical field (U.S. Patent No. 12609509). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12609509

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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