The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2026
Filed:
Feb. 03, 2022
Seagate Technology Llc, Fremont, CA (US);
Florin Zavaliche, San Ramon, CA (US);
Robin Davies, Livermore, CA (US);
Thomas Larson Greenberg, Berkeley, CA (US);
Chun Wai Joseph Tong, San Jose, CA (US);
Seagate Technology LLC, Fremont, CA (US);
Abstract
The present disclosure relates to target plates for sputtering a material to form a layer of material on a substrate. In some embodiments, a target plate is made up of two or more discrete sections and/or has at least one recess to help reduce or avoid hotspots created by a rotating plasma ring created during sputtering. The present disclosure also relates to methods of actively heating and/or cooling different regions of a heat-sink backing plate while sputtering material to reduce or avoid hotspots created by a rotating plasma ring created during sputtering.