The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2026
Filed:
Mar. 22, 2023
Applicant:
Tdk Corporation, Tokyo, JP;
Inventors:
Noriaki Hamachi, Tokyo, JP;
Toshinori Matsuura, Tokyo, JP;
Junichiro Urabe, Tokyo, JP;
Kazuya Tobita, Tokyo, JP;
Yuto Shiga, Tokyo, JP;
Youichi Kazuta, Tokyo, JP;
Yuichi Takubo, Tokyo, JP;
Shunya Suzuki, Tokyo, JP;
Xuran Guo, Tokyo, JP;
So Kobayashi, Tokyo, JP;
Assignee:
TDK CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 27/28 (2006.01);
U.S. Cl.
CPC ...
H01F 27/2804 (2013.01);
Abstract
The mainline pattern and the pair of bypass patterns in the multilayer inductor can be regarded as three inductors connected in parallel in the element body. That is, in the multilayer inductor, paralleling of the inductance is realized in the element body by the mainline pattern and the pair of bypass patterns. Therefore, the inductance value of the multilayer inductor as a whole can be reduced.