The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2026

Filed:

Jan. 23, 2023
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Dipanjan Ghosh, Santa Clara, CA (US);

Ahmed Farahat, Santa Clara, CA (US);

Chetan Gupta, San Mateo, CA (US);

Assignee:

HITACHI, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/045 (2023.01); G06N 3/082 (2023.01);
U.S. Cl.
CPC ...
G06N 3/045 (2023.01); G06N 3/082 (2013.01);
Abstract

Example implementations described herein are directed to systems and methods for generating a model ensemble to reduce bias, the method involving training a plurality of machine learning models from data, each of the plurality of machine learning models trained from a first subset of the data and validated from a second subset of the data, each of the first subset and the second subset being different for each of the plurality of machine learning models; determining accuracy of each of the plurality of machine learning models based on validation against the second subset of the data; pruning the plurality of machine learning models based on the accuracy to generate a subset of the plurality of machine learning models; and forming the model ensemble from the subset of the plurality of machine learning models.


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