The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2026
Filed:
Jun. 19, 2024
Applicant:
United Semiconductor (Xiamen) Co., Ltd., Xiamen, CN;
Inventors:
Assignee:
United Semiconductor (Xiamen) Co., Ltd., Xiamen, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 25/16 (2006.01); G01B 5/00 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
G01N 25/16 (2013.01); G01B 5/0014 (2013.01); G03B 27/42 (2013.01);
Abstract
A reticle thermal expansion calibration method includes exposing a first group of wafers and generating a first sub-recipe, performing data mining and data parsing to generate a plurality of overlay parameters, performing a linear regression on each of the overlay parameters, and generating a first coefficient of determination for each of the overlay parameters.
Ren, Maohua. (2026). Reticle thermal expansion calibration method capable of improving sub-recipe (U.S. Patent No. 12607584). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12607584
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile