The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2026

Filed:

Feb. 11, 2022
Applicant:

Deep Reach Technology, Inc., Houston, TX (US);

Inventors:

Robert D. Blevins, San Diego, CA (US);

John Halkyard, Houston, TX (US);

Michael Rai Anderson, Houston, TX (US);

James Wodehouse, Llano, NM (US);

Samual Holmes, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E21C 50/00 (2006.01); E02F 3/88 (2006.01); E02F 3/94 (2006.01);
U.S. Cl.
CPC ...
E02F 3/945 (2013.01); E02F 3/8866 (2013.01); E21C 50/00 (2013.01);
Abstract

This disclosure addresses the problem of preventing sediment laden water ('sediment slurry') resulting from hydraulic collection of nodules from the seabed from entering the riser and lift system that carries the nodules to the surface as a slurry. An example includes collecting nodules from the seabed by hydraulic suction, separating the nodules utilizing an inverse hydrocyclone.


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