The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2026
Filed:
Oct. 18, 2021
Toray Industries, Inc., Tokyo, JP;
Taisuke Kogawa, Otsu, JP;
Jiao Lu, Otsu, JP;
Koji Kadowaki, Kamakura, JP;
Masataka Nakamura, Otsu, JP;
TORAY INDUSTRIES, INC., Tokyo, JP;
Abstract
Disclosed is a polymer composition including a polyester copolymer and a biodegradable polymer, wherein the polyester copolymer includes two types of ester bond-forming monomer residues as main structural units, when the two types of ester bond-forming monomers are defined as 'monomer A' and “monomer B”, respectively, the polyester copolymer satisfies (1) to (3) below, the biodegradable polymer has a melting point of 100° C. or higher, and the biodegradable polymer is included in an amount of 0.1% by weight or more and less than 30% by weight in 100% by weight of the total of the polyester copolymer and the biodegradable polymer. The present invention provides a polymer composition having low Young's modulus and high tensile strength. (1) An R value represented by the following formula is 0.45 or more and 0.99 or less. R=[AB]/(2[A][B])×100, where [A]: molar fraction (%) of monomer A residues in the polyester copolymer, [B]: molar fraction (%) of monomer B residues in the polyester copolymer, and [AB]: molar fraction (%) of a structure in which monomer A residues and monomer B residues are adjacent to each other (A-B and B-A) in the polyester copolymer. (2) A crystallization rate of monomer A residues and a crystallization rate of monomer B residues are less than 14%. (3) A melting point is lower than 100° C. or a clear melting point does not exist.