The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Dec. 13, 2022
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi, JP;

Inventors:

Shunpei Yamazaki, Setagaya, JP;

Sachiko Kawakami, Atsugi, JP;

Nobuharu Ohsawa, Zama, JP;

Yuji Iwaki, Isehara, JP;

Ryota Hodo, Atsugi, JP;

Kentaro Sugaya, Atsugi, JP;

Shinya Sasagawa, Chigasaki, JP;

Takahiro Fujie, Isehara, JP;

Yoshikazu Hiura, Atsugi, JP;

Toshiki Sasaki, Kawasaki, JP;

Takeyoshi Watabe, Atsugi, JP;

Kunihiko Suzuki, Isehara, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10K 71/00 (2023.01); H10K 50/17 (2023.01); H10K 85/60 (2023.01);
U.S. Cl.
CPC ...
H10K 71/00 (2023.02); H10K 85/6572 (2023.02); H10K 50/171 (2023.02);
Abstract

To provide a light-emitting element in which an organic compound layer can be processed at once by a photolithography technique. A first electrode and an organic compound layer including an electron-injection layer are formed over an insulating surface. The electron-injection layer is the outermost layer of the organic compound layer and contains an organic compound having a basic skeleton and an acid dissociation constant pKa of greater than or equal to 1. A sacrificial layer and a mask are formed over the electron-injection layer and the sacrificial layer is processed into an island shape using the mask. With use of the island-shaped sacrificial layer as a mask, the organic compound layer is processed into an island shape to cover the first electrode. Part of the island-shaped sacrificial layer is removed with an acidic chemical solution to expose the electron-injection layer. A second electrode is formed to cover the electron-injection layer.


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