The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Dec. 06, 2022
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Jae Hee Kim, Yongin-si, KR;

Ki Nyeng Kang, Yongin-si, KR;

In Pyo Kim, Yongin-si, KR;

Jeong Kook Wang, Yongin-si, KR;

Hyo Jeong Lee, Yongin-si, KR;

Jong Hwan Cha, Yongin-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10H 29/14 (2025.01); H10H 20/821 (2025.01); H10H 20/831 (2025.01); H10H 20/84 (2025.01); H10H 20/851 (2025.01); H10H 20/01 (2025.01);
U.S. Cl.
CPC ...
H10H 29/142 (2025.01); H10H 20/821 (2025.01); H10H 20/831 (2025.01); H10H 20/84 (2025.01); H10H 20/851 (2025.01); H10H 20/032 (2025.01); H10H 20/034 (2025.01);
Abstract

A display device may include a first electrode and a second electrode spaced from each other on a substrate. A light emitting element may be on the first electrode and the second electrode. A first insulating pattern may be on the light emitting element. A first contact electrode may be on a first side of the first insulating pattern and contacting a first end of the light emitting element. A second insulating pattern may be on the first insulating pattern and partially covering the first contact electrode. A third insulating layer may be on the second insulating pattern. A second contact electrode may be on a second side of the first insulating pattern, and contact a second end of the light emitting element that is exposed from the first insulating pattern, the second insulating pattern, and the third insulating layer.


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