The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Jul. 10, 2023
Christian Buske, Bielefeld, DE;
Christian Buske, Bielefeld, DE;
Katharina Richter, Hallet Cove, AU;
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Abstract
The present invention provides a process for producing a plasma-activated liquid. A first plasma source is supplied with a first working gas and the first plasma source is used to generate a plasma in the first working gas so that the first plasma source provides a first reactive gas stream. A further plasma source is supplied with a further working gas and the further plasma source is used to generate a plasma in the further working gas so that the further plasma source provides a further reactive gas stream. A plasma-activated liquid is produced using the first and the further reactive gas stream. The composition of the first working gas differs from the composition of the further working gas. An appropriately configured apparatus and a use of such an apparatus for producing a plasma-activated liquid are likewise described.