The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Jan. 24, 2023
Georgia Tech Research Corporation, Atlanta, GA (US);
National Institute of Standards and Technology, Boulder, CO (US);
Chandra Raman, Decatur, GA (US);
Elizabeth Donley, Boulder, CO (US);
John Kitching, Boulder, CO (US);
Chao Li, Atlanta, GA (US);
Gabriela Martinez, Boulder, CO (US);
William Mcgehee, Boulder, CO (US);
Georgia Tech Research Corporation, Atlanta, GA (US);
National Institute of Standards and Technology, Gaithersburg, MD (US);
Abstract
An exemplary embodiment of the present disclosure provides a chip-scale atomic beam system comprising an atomic vapor source, a plurality of channels, and a propagation chamber. The atomic vapor source chamber can comprise an atomic vapor source configured to emit an atomic vapor. The plurality of channels can have first ends and second ends. The first ends can be in fluid communication with the atomic vapor source chamber. The plurality of channels can be configured to collimate the atomic vapor as it moves through the plurality of channels from the first ends to the second ends. The propagation chamber can be in fluid communication with the second ends of the plurality of channels. The propagation chamber can have an internal pressure less than an internal pressure of the atomic vapor source chamber to enable the collimated atomic vapor to propagate through the propagation chamber.