The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Sep. 13, 2021
Zeon Corporation, Tokyo, JP;
Takashi Tsutsumi, Tokyo, JP;
ZEON CORPORATION, Tokyo, JP;
Abstract
Provided is a negative photosensitive resin composition. The negative photosensitive resin composition contains a polymer and a photo-radical generator. The polymer includes a structural unit (I) represented by formula (I), shown below, and a structural unit (II) represented by formula (II), shown below. In formula (I), Rto Reach indicate, independently of one another, a hydrogen atom, an alkyl group, or an aromatic ring group, Rto Rmay be bonded to form a ring, Rindicates a hydrogen atom or an alkyl group, X indicates an alkylene group having a carbon number of 1 to 10, and m indicates 0, 1, or 2. In formula (II), Rto Reach indicate, independently of one another, a hydrogen atom, an alkyl group, or an aromatic ring group, Rto Rmay be bonded to form a ring, and n indicates 0, 1, or 2.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile