The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Oct. 20, 2021
Applicant:

3m Innovative Properties Company, St. Paul, MN (US);

Inventors:

Adam T. Ringberg, St. Paul, MN (US);

Vivian W. Jones, Woodbury, MN (US);

James A. Phipps, River Falls, WI (US);

Tri D. Pham, Woodbury, MN (US);

Przemyslaw P. Markowicz, Woodbury, MN (US);

Mark A. Roehrig, Stillwater, MN (US);

Stephen P. Maki, North St. Paul, MN (US);

Bing Hao, Woodbury, MN (US);

David J. Rowe, Roseville, MN (US);

Serena L. Mollenhauer, Robertsa, WI (US);

Mikhail A. Belkin, Chicago, IL (US);

Zhaohui Yang, North Oaks, MN (US);

Jathan D. Edwards, Afton, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); G02B 5/00 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0056 (2013.01); G02B 5/005 (2013.01);
Abstract

An optical construction includes a lens layer and optically opaque first and second mask layers. The lens layer has a first major surface including a plurality of microlenses arranged along orthogonal first and second directions. The first and second mask layers are spaced apart from the first major surface and define respective pluralities of through first and second openings therein arranged along the first and second directions. The first mask layer is disposed between the structured first major surface and the second mask layer. There is a one-to-one correspondence between the microlenses and the first and second openings. The optical construction includes an intermediate layer disposed between the structured first major surface and the first mask layer and including an undulating second major surface facing, and in substantial registration with, an undulating third major surface of first mask layer so as to define a substantially uniform spacing therebetween.


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